| 摘要 |
In an apparatus for controlling a gas-rise pattern in a vacuum treatment process a gas inlet ( 1 ) is operatively connected with a mass-flow-controller MFC ( 2 ); said MFC ( 2 ) being again operatively connected via a first valve ( 5 ) with a vacuum chamber ( 3 ) and in parallel via second valve ( 6 ) with a vent-line ( 4 ). Said connection with the vent-line ( 4 ) further comprises means for varying the pump cross section of said vent-line ( 4 ). In another embodiment the apparatus for controlling a gas-rise pattern in a vacuum treatment process comprises a gas inlet ( 13 ) operatively connected with a vacuum chamber ( 3 ) via a valve ( 11 ), wherein the connection between gas inlet ( 13 ) and valve ( 11 ) further comprises a diaphragm ( 12 ). |
