STRUCTURAL MEMBER TO BE USED IN APPARATUS FOR MANUFACTURING SEMICONDUCTOR OR FLAT DISPLAY, AND METHOD FOR PRODUCING THE SAME

摘要

Disclosed is a structural member for a manufacturing apparatus, which comprises a metal base member mainly composed of aluminum, a high-purity aluminum film formed on the surface of the metal base member, and a nonporous amorphous aluminum oxide passivation film which is formed by anodizing the high-purity aluminum film. Also disclosed is a method for producing a structural member for a manufacturing apparatus, wherein a high-purity aluminum film is formed on the surface of a metal base member mainly composed of aluminum, and then the high-purity aluminum film is anodized in a chemical conversion liquid having a pH of 4-10 and containing a nonaqueous solvent, which has a dielectric constant lower than that of water and dissolves water, thereby converting at least a surface portion of the high-purity aluminum film into a nonporous amorphous aluminum oxide passivation film.