发明名称 METHOD AND EQUIPMENT FOR INSPECTION, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a system in which outputs of as many drive systems as possible can be used when a lithographing position moves from one target to next target on a substrate. <P>SOLUTION: The drive system plays a role in moving a substrate, for example, in a lower location of an illumination system or a measuring radiation beam. The first drive system drives the substrate in a direction of X, and the second drive system drives the substrate in a direction of Y. Targets are arranged in a lattice form in order to measure a form of a surface of the substrate. It is not performed that directions of the lattice are aligned along the direction of X and the direction of Y and thereby only one drive system is required to act for moving a lithographing position from one target to next target, but it is performed that the directions of the lattice are aligned along directions having some angles to the X and the Y axes and thereby both the drive systems are required to act for moving a lithographing position between targets. Also targets (or sub-targets in a target) can be reciprocally arranged in such a way that spaces of scribing lanes are saved and the routes most economical are formed among them. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008160107(A) 申请公布日期 2008.07.10
申请号 JP20070322284 申请日期 2007.12.13
申请人 ASML NETHERLANDS BV 发明人 HOOGENBOOM THOMAS LEO MARIA;PLUG REINDER TEUN;SCHAAR MAURITS VAN DER
分类号 G01M99/00;H01L21/027 主分类号 G01M99/00
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