| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus corresponding to a large substrate, preventing decrease in the pattern resolution even when an exposure gap changes in pattern exposure using the proximity exposure apparatus. <P>SOLUTION: The proximity exposure apparatus comprises at least an exposure light source lamp 10, an elliptic mirror 20, a cold mirror 30, a filter 40, an integrator lens 50, a collimation mirror 60, a reflection mirror 70 and a photomask 80, wherein the lens shape of the integrator lens 50 is changed from rectangular to circular. <P>COPYRIGHT: (C)2008,JPO&INPIT |
