| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method, capable of stably extruding a processing solution, when extruding the processing solution that remains in a nozzle and a processing solution inlet part connected to the nozzle by means of a gas. SOLUTION: During a period that extruding processing is stopped and chemical processing is executed, an upstream-side valve V1 and a downstream-side valve V2 are closed, and an inter-valve region VR held between the upstream side valve V1 and the downstream-side valve V2 is adjusted to atmospheric pressure P0. After the chemical processing, the downstream-side value V2 is opened prior to the open of the upstream-side valve V1 to start chemical extrusion processing. At this time, pressure applied to remaining chemical is the atmospheric pressure P0, and thereby the remaining chemical will not be extruded. Consequently, the remaining chemical can be prevented from being extruded suddenly at original pressure P1. COPYRIGHT: (C)2008,JPO&INPIT
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