发明名称 SUBSTRATE GAP ADJUSTING DEVICE, METHOD FOR ADJUSTING SUBSTRATE GAP, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate gap adjusting device with which a gap between substrates corresponding to a collective region is easily adjustable at a time by deforming the substrates into fixed shapes, a method for adjusting the substrate gap, and a method for manufacturing a liquid crystal device. SOLUTION: With the substrate gap adjusting device 1, the substrate gap between an element substrate 51 and a counter substrate 52 facing and stuck thereto is adjustable. The substrate gap adjusting device 1 is equipped with a placing part 26, a supporting member 41 and a supporting ring 43 arranged on the placing part 26. The element substrate 51 is arranged on the supporting member 41. In this state, a periphery of the element substrate 51 is pressed downward with a substrate pressing part 32 of which the moving range is in a direction normal to a flat face including the supporting ring 43. Thereby the element substrate 51 is deformed into a state in which it is brought into contact with both of the supporting member 41 and the supporting ring 43. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008158270(A) 申请公布日期 2008.07.10
申请号 JP20060347215 申请日期 2006.12.25
申请人 SEIKO EPSON CORP 发明人 KONDO MASAHIKO
分类号 G02F1/13;G02F1/1339 主分类号 G02F1/13
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