发明名称 Projection Optical System, Exposure Apparatus, and Exposure Method
摘要 An imaging optical system that has liquid interposed in an optical path to the image plane to achieve a large effective image-side numerical aperture larger than, for example, 1.4, while a relatively large effective imaging region can be achieved. The imaging optical system that projects an image of a first surface onto a second surface. The optical path between the projection optical system and the second surface can be filled with liquid with a refractive index larger than 1.5, where a refractive index of gas in an optical path within the imaging optical system is 1. The imaging optical system comprises a boundary lens that can be contacted with the gas on the side of the first surface and that can be contacted with the liquid on the side of the second surface, and the boundary lens has a positive refracting power and is made of an optical material having a refractive index larger than 1.8.
申请公布号 US2008165336(A1) 申请公布日期 2008.07.10
申请号 US20050658918 申请日期 2005.07.22
申请人 NIKON CORPORATION 发明人 OMURA YASUHIRO;OWA SOICHI
分类号 G03B27/70;G03B27/54 主分类号 G03B27/70
代理机构 代理人
主权项
地址