发明名称 Optical mask employed for manufacturing array substrate, array substrate and method for manufacturing the same
摘要 The invention provides wiring, which can form or disconnect freely the adjacent exposure regions by employing the same optical mask under a condition that a plurality of array substrates are produced on one mother glass substrate; and an optical mask, which can be inspected by utilizing the same probe device for inspecting even though under a condition that the same mother glass substrate is used to produce the array substrates with different sizes; array substrates; and the manufacture method of the same. The solution means is: the above optical mask is formed to allow: the wiring in upper section at up and down direction is formed in the upper end section of the array substrate, and the wiring in lower section at up and down direction is formed in the lower end section; and a "U shape turning section towards the boundary", which is turned in a U shape to the boundary at the lower end side of said array substrate, is formed, and a "U shape turning section towards the center", which is turned again in a U shape to the center section of said array substrate, is formed.
申请公布号 US2008164524(A1) 申请公布日期 2008.07.10
申请号 US20070002704 申请日期 2007.12.18
申请人 INFOVISION OPTOELECTRONICS HOLDINGS LIMITED 发明人 KAWANO HIDEO;SUNAYAMA HIDEKI
分类号 H01L27/12;G02F1/13;G02F1/1368;G03F1/00;G03F1/70;H01L21/84 主分类号 H01L27/12
代理机构 代理人
主权项
地址