发明名称 |
Method of forming a phase change layer by electro-chemical deposition and manufacturing of a storage node and a phase change memory device using the method |
摘要 |
Provided are a method of forming a phase change layer, and methods of manufacturing a storage node, and a phase change memory device using the method. The method of forming a phase change layer uses an electro-chemical deposition (ECD) method, in particular it includes forming an electrolyte (12) by mixing a solvent and precursors, each precursor containing an element of the phase change layer, dipping an anode plate (14) and a cathode plate (16) in the electrolyte to be spaced apart from each other, wherein the cathode plate is a substrate on which the phase change layer is to be deposited, setting deposition conditions of the phase change layer, and supplying a voltage between the anode plate and the cathode plate.
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申请公布号 |
EP1942534(A2) |
申请公布日期 |
2008.07.09 |
申请号 |
EP20070150397 |
申请日期 |
2007.12.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG, YOUN-SEON;OH, SEUNG-JIN;SHIN, WOONG-CHUL;BACK, KAE-DONG |
分类号 |
H01L45/00;C25D9/04 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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