DEVELOPING APPARATUS FOR SEMICONDUCTOR AND ITS CONTROL METHOD

摘要

An apparatus for developing semiconductors and a method for controlling the same are provided to reduce the loss time by removing a not necessary return operation of a developer spray nozzle. An apparatus for developing semiconductors includes a wafer rotation unit(11), a developer spray nozzle(12), and a rinse liquid spraying nozzle(13). The rinse liquid spraying nozzle having a height higher than the developer spray nozzle is implemented in order to prevent interference between moving paths of the spray nozzles for development and rinse. The wafer rotation unit includes a spinner for rotating wafers and a cup member for moving up and down so as to block the developer and the rinse liquid generated from the wafers which are rotated by the spinner.