发明名称 IMIDE-URETHANE RESIN, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME, AND CURED OBJECT OBTAINED THEREFROM
摘要 <p>[PROBLEMS] To provide a photosensitive resin composition which has excellent photosensitivity and gives a cured object reduced in warpage and excellent in flexing properties, adhesion, pencil hardness, solvent resistance, acid resistance, heat resistance, resistance to gold plating, etc. [MEANS FOR SOLVING PROBLEMS] A urethane resin (A) soluble in aqueous alkali solutions and curable with actinic energy rays which is obtained by reacting a diisocyanate compound (a) with a tetrabasic acid dianhydride (b) to obtain a compound (E), reacting the compound (E) with a hydroxylated compound (c) having an unsaturated group and optionally with a hydroxylated compound (d) other than the compound (c) to obtain a compound (F), and further reacting hydroxy groups of the compound (F) with a diisocyanate compound (e).</p>
申请公布号 KR20080064841(A) 申请公布日期 2008.07.09
申请号 KR20087009568 申请日期 2008.04.22
申请人 NIPPON KAYAKU KABUSHIKI KAISHA 发明人 TANAKA RYUTARO;KURIHASHI TORU
分类号 C08G18/67;C08G18/00;C08G18/30;G03F7/004 主分类号 C08G18/67
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