发明名称 MOTHERSUBSTRATE AND METHOD OF MEASURING RESISTANCE OF THIN FILM TRANSISTER ARRAY SUBSTRATE THEREOF
摘要 A mother substrate and a method for measuring resistance of a thin film transistor array substrate thereof are provided to measure resistance of an actual wiring in consideration of contact resistance without damaging the thin film transistor array substrate. A mother substrate includes a first region, a second region, a first resistance pattern(110), and a second resistance pattern(120). A thin film transistor array substrate is formed on the first region. The second region is removed in forming the thin film transistor array substrate. The first resistance pattern is formed on the second region and includes first pad units(114), a line unit(112), and first connection units(116). The first pad units are in contact with resistance measuring terminals. The line unit is formed in the same condition as the wiring of the thin film transistor array substrate and has the same width as the wiring. The first connection units connect the pad units and the line unit. The second resistance pattern includes second pad units(124) and second connection units(126). The second pad units are the same as the first pad units. The second connection unit are the same as the first connection units.
申请公布号 KR20080064561(A) 申请公布日期 2008.07.09
申请号 KR20070001604 申请日期 2007.01.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, SO WOON;YANG, SUNG HOON;CHAI, CHONG CHUL
分类号 G01R27/00 主分类号 G01R27/00
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