APPARATUS AND METHOD FOR DETECTING SUBSTRATE DEMAGE

摘要

An apparatus and a method for detecting substrate damage are provided to reduce a manufacturing cost by minimizing the damage of electrodes. An apparatus for detecting substrate damage, which is connected to a plasma process apparatus for generating plasma using an RF(Radio Frequency) voltage from an RF power supply unit and processing a surface of a substrate on electrodes, includes a substrate DC(Direct Current) voltage calculating unit(404) and a substrate damage determining unit(406). The substrate DC voltage calculating unit calculates a substrate DC voltage included in an input voltage signal during plasma process and outputs the calculated substrate DC voltage. The substrate damage determining unit determines whether or not substrates are damaged using the substrate DC voltage.