发明名称
摘要 PROBLEM TO BE SOLVED: To provide a method for treating an organic halogen compound with a small configuration at a low cost by which a reaction period of time can be shortened by eliminating a water treatment due to an in-solution treatment. SOLUTION: Water 3 and an alkaline material 4 are added to a solid 1 onto which the organic halogen compound is deposited and adsorbed, then the solid is irradiated with microwave 5 in a wet condition to quickly cause an alkali substitution reaction and an oxidative degradation reaction. Thus, the waste liquid treatment caused by the conventional in-aqueous solution treatment is eliminated, thereby making an apparatus low in cost and small in size. Also, since water content in a particulate material after treatment is small, its handling is made excellent and powder transportation, or the like, is facilitated. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP4138559(B2) 申请公布日期 2008.08.27
申请号 JP20030102779 申请日期 2003.04.07
申请人 发明人
分类号 B09B3/00;A62D3/178;A62D3/36;A62D3/38;A62D101/22;A62D101/28;A62D101/47;B01J19/12;B09C1/02;B09C1/08;C07B35/06;C07B37/06;C07C39/28;C07D319/24 主分类号 B09B3/00
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