| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microelectronic apparatus that is manufactured by using a high performance/throughput lithography scanner and a method for manufacturing the same. <P>SOLUTION: The method used to manufacture microelectronic equipment, wherein a dummy field on a substrate is exposed by using the lithography scanner at a first speed, a production field on the substrate is exposed by using the lithography scanner at a second speed, and the first speed is substantially greater than the second speed. In a related embodiment, the exposure includes the exposure of a non-critical layer in the equipment using the lithography scanner at the first speed and the exposure of an important layer at the second speed, and the first speed is substantially greater than the second speed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
