发明名称 PLASMA PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a microwave plasma processing method using a radial line slot antenna, for preventing abnormal discharge by improving close contact between a slow-wave plate in the antenna and a slot plate as part of a microwave radiation plane. <P>SOLUTION: The slot plate 16 is formed of a material having a thermal expansion coefficient approximate to that of the slow-wave plate 18. Otherwise, the slot plate 16 is formed by depositing metal onto a dielectric board as part of the slow-wave plate 18. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008243827(A) 申请公布日期 2008.10.09
申请号 JP20080144962 申请日期 2008.06.02
申请人 OMI TADAHIRO;TOKYO ELECTRON LTD 发明人 OMI TADAHIRO;HIRAYAMA MASAKI;SUGAWA SHIGETOSHI;GOTO TETSUYA
分类号 H05H1/46;B01J19/08;C23C16/511;H01J37/32;H01L21/3065;H01L21/31 主分类号 H05H1/46
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