| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and a device where, when a transparent conductive film is formed on a substrate by a sputtering process, damage caused by the incidence of secondary electrons on the substrate is suppressed, and also, film formation time can be shortened, further, to provide an organic EL element in which damage caused by plasma is reduced, and to provide a method for producing a liquid crystal display. <P>SOLUTION: A magnetic shield having an opening part is inserted into a space between a target and a substrate. The target is sputtered, so as to form a first transparent conductive film on the substrate. The magnetic shield is removed from the space between the target and the substrate. The target is sputtered, so as to form a second transparent conductive film on the first transparent conductive film. <P>COPYRIGHT: (C)2009,JPO&INPIT |
