| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask which can prevent the generation of static electricity to hardly cause the electrostatic damage of the photomask or the damage of a light shielding film pattern and does not impair the accuracy of the light shielding pattern, and to provide its manufacturing method. <P>SOLUTION: The photomask is provided with a transparent substrate, a transparent conductive film formed on the transparent substrate, and a light shielding film pattern formed on the transparent conductive film. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
