| 摘要 |
PROBLEM TO BE SOLVED: To obtain a negative-type photosensitive polyimide precursor composition giving a good pattern with an alkali developing solution. SOLUTION: The photosensitive polyimide precursor composition is based on a polymer containing two organic groups -COOH and -COOR1 and giving a prebaked film of 10 μm thickness in which the mole fraction -COOH/ (- COOH)+(-COOR1)} of -COOH is 0.10-0.75. (R1 stands for a 1-30C organic group and 50-100 mol% of R1 is an organic group containing a photosensitive group). |
