| 摘要 |
<p>An exposure apparatus for semiconductor device fabrication is provided to prevent contamination such as water mark generated by contact of water or liquid material with a substrate and to improve resolution for a mask pattern and to obtain an accurate pattern. An exposure apparatus for semiconductor device fabrication comprises a lens system for forming light to expose a semiconductor substrate(10); a transparent liquid material(300) for light refraction; a receiving unit(400) for storing the liquid material. The receiving unit includes a lens system, a reticle, and a transparent window.</p> |
