| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for producing a three-dimensional photonic crystal to improve device characteristics, while easily producing a complicated three-dimensional structure, especially a three-dimensional periodic structure in a nano-photonic crystal with high precision at a low cost; and to provide the three dimensional photonic crystal. <P>SOLUTION: The method for producing the three-dimensional photonic crystal includes: a process for preparing a base material having a first face crossing a second face with a first angle; a process for forming a first mask on the first face; a process for forming pores in the base material by applying dry-etching to the first face from a second angle by using the first mask; a process for forming a second mask on the second face; and a process for forming pores in the base material by applying dry-etching to the second face from a third angle by using the second mask. The first and second masks are each formed in the surface layer of the mask forming face of the base material by implanting a focused ion beam. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
