发明名称 |
Composition for preparing nanoporous material |
摘要 |
Disclosed herein is a composition for preparing a nanoporous material. The composition comprises i) a cyclodextrin derivative, ii) a thermostable matrix precursor, and iii) a solvent for dissolving the components i) and ii). The composition enables the preparation of a low dielectric constant film in which nanopores with a size of 20 Å or less are uniformly distributed.
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申请公布号 |
US7459549(B2) |
申请公布日期 |
2008.12.02 |
申请号 |
US20040002187 |
申请日期 |
2004.12.03 |
申请人 |
SAMSUNG CORNING CO., LTD. |
发明人 |
YIM JIN HEONG;CHOI BYOUNG KI;AN DUK KEUN |
分类号 |
C08B37/16;C08G77/12;C08G77/18;C08G77/38 |
主分类号 |
C08B37/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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