发明名称 Composition for preparing nanoporous material
摘要 Disclosed herein is a composition for preparing a nanoporous material. The composition comprises i) a cyclodextrin derivative, ii) a thermostable matrix precursor, and iii) a solvent for dissolving the components i) and ii). The composition enables the preparation of a low dielectric constant film in which nanopores with a size of 20 Å or less are uniformly distributed.
申请公布号 US7459549(B2) 申请公布日期 2008.12.02
申请号 US20040002187 申请日期 2004.12.03
申请人 SAMSUNG CORNING CO., LTD. 发明人 YIM JIN HEONG;CHOI BYOUNG KI;AN DUK KEUN
分类号 C08B37/16;C08G77/12;C08G77/18;C08G77/38 主分类号 C08B37/16
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