METHOD OF SEMICONDUCTOR FABRICATION IN CORPORATING DISPOSABLE SPACER INTO ELEVATED SOURCE/DRAIN PROCESSING,申请号EP20050735763-传众专利搜索

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发明名称	METHOD OF SEMICONDUCTOR FABRICATION IN CORPORATING DISPOSABLE SPACER INTO ELEVATED SOURCE/DRAIN PROCESSING
摘要
申请公布号	EP1756860(A4)	申请公布日期	2008.12.17
申请号	EP20050735763	申请日期	2005.04.13
申请人	FREESCALE SEMICONDUCTOR, INC.	发明人	CHEN, JIAN;MORA, RODE R.;ROSSOW, MARC A.;SHIHO, YASUHITO
分类号	H01L21/336;H01L21/265;H01L29/78	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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