| 摘要 |
<p>The device has a layer (10) i.e. substrate, made of a semiconductor material, and another layer (12) running on the former layer. Two intermediate layers (14, 16) are formed and run between the two layers. The layer (16) facing the layer (12) contains an eutectic mixture . An electrically conductive connection is formed with the layer (10), and an electrically conductive contact (15) is penetrated from the layer (12). The contact has a solderable or metallically wettable material, which is alloyed in the layer (12) or forms a mixture with a material of the layer (12). An independent claim is also included for a method for manufacturing a metal semiconductor contact.</p> |
