| 摘要 |
<p>An exposure apparatus provided with an optical system (PL) that has one optical element (FL) to which at least two of three or more exposure lights are guided, and that is capable of irradiating three or more exposure lights onto exposure fields that respectively correspond to the exposure lights, with the exposure apparatus multiply exposing a predetermined field (S) on a substrate (P) with images of a plurality of patterns that are formed based on the three or more exposure lights that are respectively irradiated onto the three or more exposure fields.</p> |
