PHOTOMASK, METHOD FOR MANUFACTURING SUCH PHOTOMASK, PATTERN FORMING METHOD USING SUCH PHOTOMASK AND MASK DATA CREATING METHOD

摘要

A mask pattern including a light-shielding portion 101 and a semi-light-shielding portion 102 is provided on a transparent substrate 100 having a transparent property against exposing light so as to be surrounded with a transparent portion 104 . The semi-light-shielding portion 102 is disposed in an outer region of the mask pattern and partially transmits the exposing light in an identical phase to the exposing light passing through the transparent portion 104 .