Coating compositions for use with an overcoated photoresist
摘要
<p>Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use of low activation temperature thermal acid generators as well as multiple thermal treatments to process a layer of the underlying coating composition.</p>
申请公布号
EP1600814(A3)
申请公布日期
2008.12.17
申请号
EP20050253018
申请日期
2005.05.17
申请人
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C.
发明人
COLEY, SUZANNE;TREFONAS, PETER, III;FALLON, PATRICIA E.;WAYTON, GERALD B.