发明名称 Coating compositions for use with an overcoated photoresist
摘要 <p>Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use of low activation temperature thermal acid generators as well as multiple thermal treatments to process a layer of the underlying coating composition.</p>
申请公布号 EP1600814(A3) 申请公布日期 2008.12.17
申请号 EP20050253018 申请日期 2005.05.17
申请人 ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. 发明人 COLEY, SUZANNE;TREFONAS, PETER, III;FALLON, PATRICIA E.;WAYTON, GERALD B.
分类号 G03F7/09;G03F7/11;H01L21/027 主分类号 G03F7/09
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