发明名称 Measuring method, exposure apparatus, and device manufacturing method
摘要 A measuring method that utilizes a bandpass filter and a measurement apparatus to measure an intensity of light having a predetermined wavelength among lights emitted from a light source, the bandpass filter transmitting the light having the predetermined wavelength, the measurement apparatus measuring an absolute intensity of an incident light includes the steps of measuring an output of the measurement apparatus continuously, stopping or starting an emission of the light source in the measuring step, calculating a first extreme value t->t0-0 and a second extreme value t->t0+0 in the output of the measurement apparatus at time t0 where t is time in the measuring step, and t0 is time when the emission of the light source stops; and calculating a difference between the first extreme value t->t0-0 and the second extreme value t->t0+0.
申请公布号 US7465936(B2) 申请公布日期 2008.12.16
申请号 US20060359303 申请日期 2006.02.21
申请人 CANON KABUSHIKI KAISHA 发明人 AMEMIYA MITSUAKI
分类号 G01T1/16 主分类号 G01T1/16
代理机构 代理人
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