发明名称 Semiconductor device and fabrication process thereof
摘要 The semiconductor device uses an insulating resin that contains at least a resin anti-repellent for adjusting wettability of the insulating resin. The insulating resin is applied on a circuit board, and a semiconductor element is placed thereon and pressed against it. The applied pressure pushes out a portion of the insulating resin under the semiconductor element. This portion of the insulating resin combines with a portion of the insulating resin around the semiconductor element to form a resin fillet on the side surfaces of the semiconductor element.
申请公布号 US7466030(B2) 申请公布日期 2008.12.16
申请号 US20030668234 申请日期 2003.09.24
申请人 SHARP KABUSHIKI KAISHA 发明人 SEKO TOSHIHARU
分类号 H01L23/29;H01L23/48;H01L21/56;H01L21/60;H01L23/498 主分类号 H01L23/29
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