PLASMA PROCESSING SYSTEM, ANTENNA, AND USE OF PLASMA PROCESSING SYSTEM

摘要

A plasma processing apparatus including antenna is provided to prevent a discharge error and to generate uniform and stable plasma by not generating a gap between a metal electrode and dielectric cover. A plasma processing apparatus processes an object using plasma generated by exciting a gas with an electromagnetic wave, and includes a treatment receptacle, an electromagnetic wave source, a conductor rod, a dielectric plate(305), and a metal electrode(310). The electromagnetic wave source outputs an electromagnetic wave. The conductor rod transmits the electromagnetic wave outputted from the electromagnetic wave source. A penetration hole(305a) is formed on the dielectric plate which emits the electromagnetic wave transmitted from the conductor rod. The metal electrode is connected to the conductor rod through the penetration hole formed in the dielectric plate. An open surface of the metal electrode is covered with the dielectric cover(320).