| 摘要 |
Patterns (27, 28, 29) developed on an intaglio plate are transferred onto an electrode layer (32) on a side of a surface (31a) facing a medium (31) to which the patterns are to be transferred, then, the work is heated and the electrode layer (32) is eliminated or permitted to have high resistance in the baking furnace (40), by using the intaglio plate for holding the patterns by a developer, a transfer apparatus for transferring the patterns (27, 28, 29) developed on the intaglio plate onto the medium (31), and a baking furnace (40) for eliminating an electrode layer (32) or permitting the electrode layer to have high resistance. ® KIPO & WIPO 2009
|
