| 摘要 |
An apparatus for generating plasma is provided to control the nozzle height between the reaction gas and the source gas through the height control of the block structure. The plasma generating device(100) includes the plasma generation part(110); the plasma chamber positioned at the lower part of the plasma generation part; the upper plate structure welded as top and bottom(160); the lower plate structure(170) including a plurality of source gas nozzles; the shower head(150) providing a plurality of induction pipes(162); the reacting gas providing unit(130) supplying the reaction gas to the plasma generation part. The upper plate structure and lower plate structure provide the source gas space of movement for the source gas supply.
|
