发明名称 Structure of gold bumps and gold conductors on one IC die and methods of manufacturing the structures
摘要 A method for fabricating multiple metal layers includes the following steps. An electronic component is provided with multiple contact points. A first metal layer is deposited over said electronic component. A first mask layer is deposited over said first metal layer. A second metal layer is deposited over said first metal layer exposed by an opening in said first mask layer. Said first mask layer is removed. A second mask layer is deposited over said second metal layer. A third metal layer is deposited over said second metal layer exposed by an opening in said second mask layer. Said second mask layer is removed. Said first metal layer not covered by said second metal layer is removed.
申请公布号 US7465654(B2) 申请公布日期 2008.12.16
申请号 US20050178541 申请日期 2005.07.11
申请人 MEGICA CORPORATION 发明人 CHOU CHIU-MING;LIN MOU-SHIUNG
分类号 H01L21/44;H01L21/00 主分类号 H01L21/44
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