发明名称 GALVANISCHER PROZESS ZUR FÜLLUNG VON DURCHGANGSLÖCHERN MIT METALLEN, INSBESONDERE VON LEITERPLATTEN MIT KUPFER
摘要 The present invention relates to a galvanic process for filling through-holes with metals. The process is particularly suitable for filling through-holes of printed circuit boards with copper. The process comprises the following steps: (i) formation of a narrow part in the center of a through-hole by electroplating; and (ii) filling the through-hole obtained in step (i) with metal by electroplating.
申请公布号 AT417492(T) 申请公布日期 2008.12.15
申请号 AT20050775130T 申请日期 2005.08.30
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 REENTS, BERT;PLIET, THOMAS;ROELFS, BERND;FUJIWARA, TOSHIYA;WENZEL, RENE;YOUKHANIS, MARKUS;KIM, SOUNGSOO
分类号 H05K3/42 主分类号 H05K3/42
代理机构 代理人
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