Aluminium chemical vapour deposition on silicon

摘要

Aluminium dioxide layer is applied to a silicon body in two stages: (i) heating of the silicon body to a temp. exceeding that at which an organic aluminium compound is thermally decomposed; (ii) organic aluminium compound in vapour form is led, together with a carrying gas, through a blow pipe, the outlet of which is at a short distance of the silicon body so that the vapour of the organic aluminium compound is thermally decomposed in the proximity of the silicon body and the aluminium oxide is deposited on this body.