发明名称 SPRAYING DEVICE, SPRAYING METHOD AND APPARATUS FOR TREATING SUBSTRATES USING THE SAME
摘要 The fluid spray, and the fluid jet method and substrate processing apparatus using the same are provided to improve the process efficiency of substrate and yield of product by spreading uniformly the process fluid on the substrate. The fluid jet method comprises the first step(S100) for providing the fluid, and the second step(S200) for controlling direction and the third step(S300) for discharging the fluid. In the first step, the fluid is provided for the fluid spray. In the second step, the discharge direction of the fluid is controlled. In the third step, the fluid is discharged according to the controlled direction.
申请公布号 KR100873938(B1) 申请公布日期 2008.12.15
申请号 KR20070100176 申请日期 2007.10.05
申请人 SEMES CO., LTD. 发明人 LEE, BONG MOON
分类号 H01L21/304 主分类号 H01L21/304
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