发明名称 ALIGNMENT APPARATUS, CONTROL METHOD THEREOF, EXPOSURE APPARATUS, AND METHOD OF MANUFACUTRING SEMICONDUCTOR DEVICE BY EXPOSURE APPARATUS CONTROLLED BY THE SAME CONTROL METHOD
摘要 An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the stage in the first direction. A control unit (i) obtains a position of the stage based on an output of one of the first and second laser interferometers, (ii) controls a position of the stage based on the obtained position of the stage, (iii) performs switching of one of the first and second laser interferometers to the other of the first and second laser interferometers while the stage is moved at a constant velocity in the first direction, (iv) calculates a distance by which the stage is to be moved during a time interval, and (v) sets an initial value of the other of the first and second laser interferometers after the switching, based on a position measured by the one of the first and second laser interferometers at a start time of the time interval and the calculated distance.
申请公布号 US2008304064(A1) 申请公布日期 2008.12.11
申请号 US20080179734 申请日期 2008.07.25
申请人 CANON KABUSHIKI KAISHA 发明人 KUROSAWA HIROSHI
分类号 G01B11/00;G01B11/02;G01B21/00;G03F7/20;H01L21/00;H01L21/027;H01L21/68 主分类号 G01B11/00
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