| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a composition for forming a silica-based coating film, forming a silica-based coating film which is excellent in low dielectric property and adhesiveness, and also has satisfactory mechanical strength. <P>SOLUTION: The composition for forming the silica-based coating film includes a component (a): a siloxane resin obtained by hydrolyzing/condensing a compound represented by formula (1): R<SP>1</SP><SB>n</SB>SiX<SB>4-n</SB>; a component (b): a solvent dissolving the component (a); and a component (c): an onium salt, wherein the component (a) has a total content rate of at least one atom selected from the group consisting of H, F, B, N, Al, P, Si, Ge, Ti and C, of 0.50 mol or less per mole of Si atom, and has curing characteristics where a coating film resulting from heating at 150°C for 3 min exhibits stress of 10 MPa or higher and a coating film obtained by final curing has a relative dielectric constant of less than 3.0. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
