| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning mechanism capable of efficiently and sufficiently cleaning a raw material supply device in an injection apparatus. SOLUTION: In the raw material supply device 1, two shutters 3, 5 are cylindrically vertically provided at the upper part of a heating cylinder 10 of an injection device 9, the cylinder is portioned into three chambers, and a molding material is dropped and supplied into the heating cylinder 10 in an airtight state. The raw material supply device is provided with on-off valves 15, 16, 17, 18, 19 capable of optionally supplying compressed air into the respective chambers for the respective chambers, and has a control device 14 for controlling the respective on-off valves 15, 16, 17, 18, 19 so that blowing of the compressed air is sequentially transited from the uppermost part chamber to the immediately lower chamber. COPYRIGHT: (C)2009,JPO&INPIT
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