发明名称 |
METHOD AND APPARATUS FOR OPTICALLY ANALYZING A SURFACE |
摘要 |
In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a radial motor to move an optical head in a radial direction to detect defects at locations displaced from the edge of the wafer, and a rotational motor to rotate the optical head around the edge of the wafer to detect defects on the edge of the wafer.
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申请公布号 |
US2008304078(A1) |
申请公布日期 |
2008.12.11 |
申请号 |
US20080140154 |
申请日期 |
2008.06.16 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
FREISHLAD KLAUS;TANG SHOUHONG |
分类号 |
G01B11/02 |
主分类号 |
G01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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