发明名称 |
SEMICONDUCTOR NANOWIRE AND ITS MANUFACTURING METHOD |
摘要 |
A method for manufacturing a semiconductor nanowire having a first region and a second region includes: a step [a] for arranging catalyst particles (101) on a substrate (102); a step [b] for supplying a first raw material gas (103) so that a first region (104) grows from the catalyst particles by the VLS growth mechanism; a step [c] for forming a protection film (105) on the side wall of the first region; and a step [d] for supplying a second raw material gas (107) so that a second region (106) grows on the first region by the VLS growth mechanism. |
申请公布号 |
WO2008149548(A1) |
申请公布日期 |
2008.12.11 |
申请号 |
WO2008JP01417 |
申请日期 |
2008.06.04 |
申请人 |
PANASONIC CORPORATION;KAWASHIMA, TAKAHIRO;SAITOH, TOHRU |
发明人 |
KAWASHIMA, TAKAHIRO;SAITOH, TOHRU |
分类号 |
B82B3/00;C01B31/02;C01B33/02;H01B13/00 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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