发明名称 SEMICONDUCTOR NANOWIRE AND ITS MANUFACTURING METHOD
摘要 A method for manufacturing a semiconductor nanowire having a first region and a second region includes: a step [a] for arranging catalyst particles (101) on a substrate (102); a step [b] for supplying a first raw material gas (103) so that a first region (104) grows from the catalyst particles by the VLS growth mechanism; a step [c] for forming a protection film (105) on the side wall of the first region; and a step [d] for supplying a second raw material gas (107) so that a second region (106) grows on the first region by the VLS growth mechanism.
申请公布号 WO2008149548(A1) 申请公布日期 2008.12.11
申请号 WO2008JP01417 申请日期 2008.06.04
申请人 PANASONIC CORPORATION;KAWASHIMA, TAKAHIRO;SAITOH, TOHRU 发明人 KAWASHIMA, TAKAHIRO;SAITOH, TOHRU
分类号 B82B3/00;C01B31/02;C01B33/02;H01B13/00 主分类号 B82B3/00
代理机构 代理人
主权项
地址