| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent a mask material that is provided on a substrate table for the purpose of preventing exposure of a peripheral region of a substrate from being directly exposed to a photosensitive surface to cause dusts to drop onto a wafer. <P>SOLUTION: A mask 116 provided on the substrate table 102 is attached to a movable carrier 112. The movable carrier has a moving range in which the movable carrier at least partially circumnavigates the substrate table. The mask has a ring with an internal diameter larger than the outer shape of the substrate. The ring is configured to be able to move from a position lying on the substrate to a position hanging over the peripheral exposure region of the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
