发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method in which the cleaning of a forming mold capable of removing efficiently dirty inside of the forming mold can be carried out. SOLUTION: A forming mold cleaning sheet 8, where a plurality of fine holes through which particles of cleaning resin 9 can pass are formed on the whole surface, is prepared, the forming mold cleaning sheet 8 is clamped so as to come into contact with the whole area of parting surface of the forming mold 1 composed of an upper mold 1a and a lower mold 1b, the cleaning resin 9 is pressed to be filled into the inside of the forming mold 1 penetrating it into the forming mold cleaning sheet 8, the upper mold 1a and 1b are released after a fixed time passes, then, the forming mold cleaning sheet 8 on which the cleaning resin 9 is deposited is taken out. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008300856(A) 申请公布日期 2008.12.11
申请号 JP20080180848 申请日期 2008.07.11
申请人 RENESAS TECHNOLOGY CORP;RENASAS NORTHERN JAPAN SEMICONDUCTOR INC 发明人 TSUCHIDA KIYOSHI
分类号 H01L21/56;B29C33/68;B29C33/72;B29C45/02;B29C45/14;B29C45/17;B29K105/16;B29L9/00;B29L31/34 主分类号 H01L21/56
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