| 摘要 |
PROBLEM TO BE SOLVED: To provide a showerhead capable of depositing a uniform film in a film deposition apparatus using two or more kinds of gas. SOLUTION: The showerhead comprises a raw material gas diffusion chamber 18 and a reactive gas diffusion chamber 16. A gas passage for connecting the raw material gas diffusion chamber to a raw material gas introduction pipe is constituted in multi stages including at least one stage. Each stage has a gas passage 17 expressed by 2<SP>n-1</SP>(where n denotes the number of stages). The gas passage of the first stage is connected to a raw material gas introduction pipe 111. Each gas passage of the second and subsequent stages communicates with the gas passage of the previous stage. Each gas passage of the final stage is connected to the raw material gas diffusion chamber. COPYRIGHT: (C)2009,JPO&INPIT
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