发明名称 METHOD OF MANUFACTURING STRUCTURE ON SUBSTRATE OR IN SUBSTRATE, IMAGING LAYER FOR GENERATING SUBLITHOGRAPHIC STRUCTURE, METHOD OF INVERTING SUBLITHOGRAPHIC PATTERN, AND DEVICE OBTAINABLE BY MANUFACTURING STRUCTURE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a structure on a substrate or in a substrate. <P>SOLUTION: The method of manufacturing the structure on or in the substrate comprises: (a) a process of positioning at least one spacer structure 30 by a spacer technology on the substrate 10; (b) a process of using the at least one spacer structure and a structure generated by the spacer structure as a mask for a subsequent particle irradiation step for generating a latent image in the substrate; and (c) a process of using the latent image for further processing the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008300833(A) 申请公布日期 2008.12.11
申请号 JP20080139879 申请日期 2008.05.28
申请人 QIMONDA AG 发明人 NOELSCHER CHRISTOPH;WEIS ROLF
分类号 H01L21/306;H01L21/3065 主分类号 H01L21/306
代理机构 代理人
主权项
地址