发明名称 |
METHOD OF MANUFACTURING STRUCTURE ON SUBSTRATE OR IN SUBSTRATE, IMAGING LAYER FOR GENERATING SUBLITHOGRAPHIC STRUCTURE, METHOD OF INVERTING SUBLITHOGRAPHIC PATTERN, AND DEVICE OBTAINABLE BY MANUFACTURING STRUCTURE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a structure on a substrate or in a substrate. <P>SOLUTION: The method of manufacturing the structure on or in the substrate comprises: (a) a process of positioning at least one spacer structure 30 by a spacer technology on the substrate 10; (b) a process of using the at least one spacer structure and a structure generated by the spacer structure as a mask for a subsequent particle irradiation step for generating a latent image in the substrate; and (c) a process of using the latent image for further processing the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2008300833(A) |
申请公布日期 |
2008.12.11 |
申请号 |
JP20080139879 |
申请日期 |
2008.05.28 |
申请人 |
QIMONDA AG |
发明人 |
NOELSCHER CHRISTOPH;WEIS ROLF |
分类号 |
H01L21/306;H01L21/3065 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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