发明名称 ION IMPLANTATION DEVICE AND ION IMPLANTATION METHOD
摘要 PROBLEM TO BE SOLVED: To easily irradiate an ion beam on a non-irradiated section even though the ion beam is stopped during irradiation of the ion beam. SOLUTION: When an output of the ion beam 8 is stopped while a workpiece 1 is moved in a first movement direction, the workpiece 1 is moved in the first movement direction to an evacuation position where the ion beam 8 is not irradiated while the ion beam 8 is stopped. The ion beam 8 is again output on the evacuation position, the re-output ion beam 8 is irradiated on the workpiece 1 by moving the workpiece 1 in a second movement direction opposite to the direction of the first movement. An irradiation range of the ion beam 8 during first stopping of the ion beam 8 and an irradiation range of the re-output ion beam 8 are overlapped at least at a part of the ranges, and output of the re-output ion beam 8 is stopped so that the length of overlapped irradiation range in the direction of movement of the workpiece 1 does not exceed a dimension in the direction of the movement of the workpiece 1. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008300116(A) 申请公布日期 2008.12.11
申请号 JP20070143304 申请日期 2007.05.30
申请人 IHI CORP 发明人 YAMANAKA YOSUKE;SHIOTANI TETSUO;ODAGIRI KIYOYUKI;SHIKAYAMA HIROYUKI;AYAME YOSHIHIKO
分类号 H01J37/317;H01L21/265 主分类号 H01J37/317
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