发明名称 |
METHOD FOR GROWING GaN CRYSTAL AND GaN CRYSTAL SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for growing a GaN crystal small in the size of a reversed-polarity crystalline region and low in its density and to provide a GaN crystal substrate. SOLUTION: The method for growing a GaN crystal is one comprising the step of preparing a GaN substrate 10 containing a main crystalline region 11 and a plurality of reversed-polarity crystalline regions 12 reversed in polarity in the [0001] direction with respect to the main crystalline region and the step of growing a GaN crystal 20 by a vapor phase deposition method on the (0001) Ga main face 10g of the GaN substrate 10, wherein the GaN crystal 20 is grown so that it contains a first crystalline region 21 which grows on the main crystalline region 11 and a plurality of second crystalline regions 22 each of which grows on the reversed-polarity region 12, the second crystalline regions 22 are reversed in polarity in the [0001] direction with respect to the first crystalline region 21, and the first crystalline region 21 is higher in a crystal growth rate than the second crystalline regions 22 so as to allow the second crystalline regions 22 to be embedded therein. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008297180(A) |
申请公布日期 |
2008.12.11 |
申请号 |
JP20070147322 |
申请日期 |
2007.06.01 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
FUJIWARA SHINSUKE;SAITO TAKESHI;KAMIMURA TOMOYOSHI;NAKAHATA HIDEAKI |
分类号 |
C30B29/38;C30B25/20;H01L21/205 |
主分类号 |
C30B29/38 |
代理机构 |
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