PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME

摘要

A photosensitive compound, a photoresist composition containing the compound, and a method for preparing a photoresist pattern by using the composition are provided to improve the uniformity of coating and resolution, to reduce the line edge roughness of pattern and to enhance development and dry etching resistance. A photosensitive compound is represented by the formula 1, wherein x is an integer of 1-5; y is an integer of 2-6; and R is a C2-C20 hydrocarbon group. A photoresist composition comprises 1-85 wt% of the compound of the formula 1; 1-55 wt% of a compound which reacts the OH group of the compound of the formula 1 to bind with the photosensitive compound of the formula 1; 1-15 wt% of a photoacid generator; and 12-97 wt% of an organic solvent.