| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method for performing high-precision measurement of nonlinear deformation in a unit exposure region and high-precision superposing of patterns on a substrate. <P>SOLUTION: The exposure method of the invention for exposing a light-dark pattern on a substrate using a projection optical system includes a position detecting step (S13) of detecting positions of a plurality of micro regions in a unit exposure region of the substrate, a deformation calculating step (S14) of calculating a deformation in the unit exposure region based on information relating to the positions of the micro regions detected by the position detecting step, and a shape changing step (S15) of changing a shape of the light-dark pattern to be exposed on the substrate based on the deformation calculated by the deformation calculating step. The micro regions detected by the position detecting step include a circuit pattern formed in the unit exposure region. <P>COPYRIGHT: (C)2009,JPO&INPIT |
