发明名称 MASK MOLD, ITS MANUFACTURING METHOD AND MOLDING METHOD OF LARGE-AREA MICRO-PATTERN USING MANUFACTURED MASK MOLD
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask mold and its manufacturing method, and to provide a molding method of a large-area micro-pattern by using the manufactured mask mold which can enlarge a nano-scale micro-pattern area and minimizing interference and a stitching error between large area cells by a simple way and at a low cost. <P>SOLUTION: The pattern molding method includes; a step (S 140) of applying resists on a plurality of small molds marked with the masks or the micro-patterns, a step (S 150) of pressing the plurality of small molds and imprinting the micro-pattern of a curing resist, a step of curing the resist and a step (S 170) of releasing the plurality of small molds from the resist. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008296579(A) 申请公布日期 2008.12.11
申请号 JP20080131094 申请日期 2008.05.19
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIM JEONG GIL;CHO YOUNG TAE;SIM YOUNG-SUK;CHO SUNG HOON;LEE SUK-WON;PARK SEON MI;KWON SIN;SEO JUNG WOO;PARK JUNG WOO;CHO SUNG WOO
分类号 B29C59/02;B29C33/38;B81C99/00;G03F7/20;H01L21/027 主分类号 B29C59/02
代理机构 代理人
主权项
地址