发明名称 |
MASK MOLD, ITS MANUFACTURING METHOD AND MOLDING METHOD OF LARGE-AREA MICRO-PATTERN USING MANUFACTURED MASK MOLD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask mold and its manufacturing method, and to provide a molding method of a large-area micro-pattern by using the manufactured mask mold which can enlarge a nano-scale micro-pattern area and minimizing interference and a stitching error between large area cells by a simple way and at a low cost. <P>SOLUTION: The pattern molding method includes; a step (S 140) of applying resists on a plurality of small molds marked with the masks or the micro-patterns, a step (S 150) of pressing the plurality of small molds and imprinting the micro-pattern of a curing resist, a step of curing the resist and a step (S 170) of releasing the plurality of small molds from the resist. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008296579(A) |
申请公布日期 |
2008.12.11 |
申请号 |
JP20080131094 |
申请日期 |
2008.05.19 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
KIM JEONG GIL;CHO YOUNG TAE;SIM YOUNG-SUK;CHO SUNG HOON;LEE SUK-WON;PARK SEON MI;KWON SIN;SEO JUNG WOO;PARK JUNG WOO;CHO SUNG WOO |
分类号 |
B29C59/02;B29C33/38;B81C99/00;G03F7/20;H01L21/027 |
主分类号 |
B29C59/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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